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Diamax Cyclone Snail Lock Auto-Edge System -- Cup Wheel and Velcro Pads
The Cyclone CCWSL41 is part of Diamax's Cyclone series tools deliver high-output performance for professional stone fabricators working granite, engineered stone, and quartz. This product is designed to bring stone surfaces from rough grind through a high-gloss finish using a structured grit progression.
Manufacturer overview: 4" Cyclone Snail Lock CW Pos. 1, 100mm x 25w.
Features
- Diamax Cyclone series tooling
- Manufacturer model code: CCWSL41
- Engineered for professional stone-fabrication workflows
- Designed for polishing pads applications
- Use only on equipment rated for the tool's operating speed and cooling method (wet vs. dry)
| Property | Detail |
|---|---|
| Brand | Diamax |
| Family | Cyclone |
| Model / Part Number | CCWSL41 |
| Vendor Category | Grinders/Shapers |
| Product Type | Polishing Pads |
- Mount the pad on a hook-and-loop backer or velcro head sized for the pad diameter.
- Wet the work area continuously if using a wet polisher; dry-pad operation requires the dry-rated grit only.
- Run the polisher at the speed printed on the pad — typically 2,500–4,500 RPM for handheld stone polishers.
- Move the pad in steady overlapping passes; do not concentrate force on the pad edge.
- Step through the grit progression in order; skipping grits leaves scratch patterns visible at the final gloss step.
- Rinse the pad and the slab between grit changes.
- Rinse the tool with clean water after wet use to flush slurry from the matrix.
- Air-dry before storage; do not store wet tools in sealed containers.
- Inspect the tool for cracks, chipping, or excessive wear before every shift.
- Do not exceed the maximum RPM printed on the tool body.
- Replace the tool when cut rate drops noticeably or visible damage appears.
Always wear ANSI Z87 eye protection, hearing protection, and a dust-rated respirator. Follow OSHA silica-exposure rules and the tool manufacturer's operating instructions when fabricating stone.
Specifications
| Position | Pos. 1, Pos. 2 |